MODELING THE TOPOGRAPHY OF MICROSCRATCHES ON MIRROR SURFACES

Authors

  • Oleksandr Kravchenko
  • Oleksii Haluza
  • Alla Savchenko
  • Stanislav Pohorielov
  • Anton Rogovyi

DOI:

https://doi.org/10.26906/SUNZ.2025.2.145

Keywords:

modeling, topography, microscratches, algorithm, interpolation

Abstract

The subject of the study is the modeling of the topography of a microscratch-type defect on a flat mirror surface using modern algorithmic approaches that ensure the reproduction of smooth defect profiles with high fidelity to real data. The aim of the work is to develop an algorithm for synthesizing topographic maps to model microscratches with smooth and realistic profiles, taking into account natural depth fluctuations and the defect’s area of influence. The tasks addressed include: 1) developing a mathematical model that accounts for the key characteristics of microscratches; 2) ensuring a smooth transition between discrete points of the microscratch profile; 3) modeling depth fluctuations and the defect’s area of influence. The methods used include: algorithmic modeling of digital height maps based on the synthesis of a scratch cross-section with specified parameters; cubic spline interpolation to ensure profile smoothness and accurate contour reproduction; sinusoidal depth modulation considering amplitude and oscillation frequency, as well as nonlinear attenuation functions (exponential and cosine) for a detailed description of the defect’s influence distribution in space. A batch mode for generating synthetic dat a was also employed, allowing variation of key model parameters (maximum depth, width of the influence area, modulation amplitude coefficient, oscillation frequency, and attenuation parameters), which enables the generation of a wide range of microscratch topography variants. Results: The synthetic height maps demonstrated high correspondence with experimental data, confirming the model’s effectiveness in real-world conditions and its advantages for automated optical surface inspection systems. Conclusions: The developed model holds significant potential for integration into defect analysis systems, contributes to improving the reliability of optical devices, and is promising for further research, particularly for integration with deep l earning methods and subsequent experimental validation.

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Published

2025-06-19